PLD Course - April 2011

 

In April 2011 TSST organised its first 3-day PLD course in collaboration with:

 

Coherent - World leading in laser and laser-based solutions

Mesa-Plus institute - One of the largest nanotechnology research institutes in the world

Omicron - World leading supplier of solutions for analytic requirements under UHV-conditions

STAIB Instruments - World leading in high performance analysis instruments

 

It is expected that this event will be repeated anually. For possible pre-registration in 2012 see contact details below 

A few impression pictures are shown below.

Hands-On Training

 

Theory classes

 

Fun!

During the last decade a tremendous progress has been made in the fabrication of (complex) oxide thin films by pulsed laser deposition (PLD).

With the development of PLD controlled by high-pressure reflection high-energy electron diffraction (RHEED), it is possible to control the growth of these materials at an atomic level.

This furthermore resulted in the development of single crystal substrates with control of the terminating surface as well as new growth manipulation techniques, like pulsed laser interval deposition.

 At present, extremely sharp and homogeneous interfaces can be realized and this is, for example, utilized in oxide epitaxial heterostructures.

 

Course Objectives 

  • Participants are given profound introductions to different technological aspects of RHEED controlled PLD.
  • The knowledge is deepened during hands-on training on state-of-the-art PLD systems.
  • The course concludes with an open discussion on topics, submitted by the participants.

For more information or preliminairy applications for the next course, please send an e-mail to rodijk@tsst.nl