Heaters for deposition systems

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TSST heater

TSST provides three different types of heating stages for deposition systems, each with their own advantages; resistive, radiative and laser heating.

The choice for a certain type of heater system depends on several factors, such as: sample size, required throughput, maximum temperature and budget.

For those who are looking for a reliable heating system at relative low costs, resistive heating would be the best candidate. Due to the fact that the entire heater can be exchanged, possible cross contamination of chemical elements is kept to an absolute minimum.

Resistive heating also has the advantage that it can be combined with laser heating. Laser heating is suited for those who would like to have a high trough put of samples, or deposition at high temperatures. The heating rate of the laser heater is unprecedented and the maximum temperatures are also the highest in the deposition market currently available.

For research on larger samples, at high temperature a radiative heater would be a good option. If required this system also provides continuous rotation of the sample. All three offer homogeneous and accurate control of the substrate temperature for high repeatability of deposition experiments in oxygen rich and UHV  environments.

All heater systems are designed with a shutter and can be loaded and unloaded through a loadlock. This is done to keep the vacuum system as clean as possible in order to obtain and repeatably the best results during experiments.

All systems commonly have a positioning system with up to five degrees of freedom. This allows optimal control of the orientation of substrates for in-situ analytical purposes.

Furthermore, each system has the option to be fully computer controlled resulting in reproducible results by programmed heating and cooling cycles and positioning.

Twente Solid State Technology offers custom solutions to your requirements. The specifications mentioned here are not stringent and can always be adapted to meet your specific needs.

TSST ResitiveHeater1Resistive heating – Tmax 900°C

With resistive heating the substrate is glued or clamped  onto the surface of the heater. The complete heater is then  loaded into the vacuum chamber. When power is applied to the heater, the resistive element heats the sample holder which obtains a homogeneous temperature.

This system consists of two major components, the heater holder and the heater itself. The heater holder is able to position the heater into the desired position and houses thermocouple and electrical connections to the system.

The main advantages of this system is that it offers a robust system, suitable for most applications at relative low costs. The complete heater is easily extracted allowing the use of separate heaters for different experiments or material systems. Additionally this system can also be combined with laser heating. 



TSST RadiativeHeater


Radiative heating – Tmax 1000°C

In this system the substrate is glued or clamped onto a heating  plate, which can be loaded through the loadlock onto the heater located inside the vacuum  system.

In this system the heater  remains inside the vacuum chamber during the entire procedure. When power is applied to the heater, a heating coil radiates onto the substrate holder or sample. 

The main advantages are the higher obtainable temperature  and the larger substrate size. This larger sample size still allows full compatibility with a High Pressure RHEED system.











TSST LaserHeating

Laser heating – Tmax >1100°C

With laser heating a focussed IR-laser beam illuminates the  back of a sample plate or substrate allowing to rapidly increase the temperature.

The system consists of  three parts. The first part is the sample plate which holds the substrates, and which can be loaded and unloaded. The second part is  the holder which accepts the sample plate, but can also be used in combination with a resistive heater. The final part is the laser and optical system which focusses the high power diode laser onto the back of the sample plate.

The main advantages are the high temperature, rapid temperature increase and decrease, and ‘clean’ heating which  results in the best vacuum conditions during experiments