TSST regularly organized LPD (Pulsed Laser Desposition) courses

A broad range of subjects is discussed, from PLD basics and substrate preparations, to advanced growth techniques , and research strategies.

The course is organized in collaboration with the MESA+ institute at the MESA+ Nanolab in Enschede, the Netherlands

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Twente Solid State Technology regularly organizes courses to make people more familiar with all aspects of Pulsed Laser Deposition (PLD).

TSST provides three different types of heating stages for deposition systems, each with their own advantages; resistive, radiative and laser heating.

A broad range of subjects is discussed, from PLD basics and substrate preparations, to advanced growth techniques , and research strategies.

The contents of the course is adjusted to the knowledge level of the participants but is considered to be most suited for PhD candidates trying to obtain the maximum results on their system.

The PLD course is organized in collaboration with the MESA+ institute at the MESA+ Nanolab in Enschede, the Netherlands

After completion of the course participants will:

•             understand the technological background of pulsed laser deposition controlled by high pressure RHEED
•             have enhanced their experimental skills in pulsed laser deposition, substrate treatment, target preparation etc.
•             understand the technological background of high pressure RHEED and will be able to optimize RHEED parameters for oxide thin film growth monitoring.

 

Outline

During the last decade a tremendous progress has been made in the fabrication of (complex) oxide thin films by pulsed laser deposition  (PLD). With the development of PLD controlled by high-pressure reflection high-energy electron diffraction (RHEED), it is possible to control the growth of these materials at an atomic level.  This resulted in the development of single crystal substrates with control of the termination of the surface as well as new growth manipulation techniques; such as pulsed laser interval deposition. At present, extremely sharp and homogeneous interface can be realized. This is utilized in the growth of epitaxial oxide hetero-structures.

History

In 2011 TSST, in collaboration with the MESA+ institute organized the first PLD-course for 20 people from all over the world. The course was held at the MESA+ Nanolab which proved to be a perfect location for theory, practical, training and discussions. The enthusiasm and positive feedback from the participants led to the decision to organize the training on a regular basis. Since then the course has been held multiple times.  The course has proven to be a jump start for PhD candidates involved in PLD.

Information

For those who are interested in participating in the course, please send an e-mail to info@TSST.nl for more information.